Skywater fab adopts e-beam lithography

Skywater, the US DOD-backed secure fab, is to use Multibeam’s Multicolumn Electron-Beam Lithography (MEBL) system in its 45 nm process.

The new system was funded by a $38 million contract award from the DOD and program managed by the Air Force Research Lab.

This “security lithography” technology is designed to pattern entire wafers at 45nm and larger nodes, without the use of any masks for back-end-of-line (BEOL). Read the article in

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