SkyWater and Multibeam look to deploy innovative MEBL system

Multibeam has announced a partnership with SkyWater to deploy its Multicolumn Electron-Beam Lithography (MEBL) system into SkyWater’s expanded fabrication facility in support of its roadmap to 45 nm manufacturing capabilities.

The ground-breaking MEBL system is set to launch in 2021 and will be capable of full-wafer, all-maskless patterning at 45 nm and beyond. It was funded by a $38 million contract award from the Department of Defense in a program managed by the Air Force Research Lab. Read the article in New Electronics:

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