SkyWater and Multibeam look to deploy innovative MEBL system
Multibeam has announced a partnership with SkyWater to deploy its Multicolumn Electron-Beam Lithography (MEBL) system into SkyWater’s expanded fabrication facility in support of its roadmap to 45 nm manufacturing capabilities.
The ground-breaking MEBL system is set to launch in 2021 and will be capable of full-wafer, all-maskless patterning at 45 nm and beyond. It was funded by a $38 million contract award from the Department of Defense in a program managed by the Air Force Research Lab. Read the article in New Electronics: https://www.newelectronics.co.uk/electronics-news/skywater-and-multibeam-look-to-deploy-innovative-mebl-system/232507/